3MCUNO PhotoSHIELD Nylon

Superior Gel and Particle Removal from Photoresist and Ancillary Chemicals

• Advanced Pleat Technology(APT)
• Naturally Hydrophilic Nylon 6,6
• Low Cartridge Extractables
• Manufacturing Process
• Maximum flow in a compact design
• Provides both lower operating and differential pressure
• Increased throughput and filter lifetime